Atmospheric Pressure Radio-Frequency DBD Deposition of Dense Silicon Dioxide Thin Film

R Bazinette 1 Jean Paillol 2 Jean-François Lelièvre 1 Françoise Massines 1
1 PROMES - Procédés, Matériaux et Energie Solaire
2 SIAME - Laboratoire des Sciences de l'Ingénieur Appliquées à la Mécanique et au génie Electrique
Abstract : Radio-frequency (RF) homogeneous dielectric barrier discharge (DBD) is compared to low frequency glow DBD to make silicon oxide from Ar/NH3/SiH4. RF-DBD is a more powerful discharge, and the growth rate is not limited by precursor dissociation rate but by powder formation. Powders are not deposited in the plasma zone but in the post-discharge due to their trapping by the electric field. Modulation of the RF-DBD is a useful solution to avoid powder formation. Powders are systematically avoided if the plasma energy during time on stays below 750 µJ. RF-DBD modulation also increases the growth rate twofold compare to continuous RF. The optimum growth rate without powder corresponds to a short Ton to limit precursor dissociation, a long Toff to enhance diffusion and a fast repeat frequency to increase deposition rate.
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Article dans une revue
Plasma Processes and Polymers, Wiley-VCH Verlag, 2016, 13 (10), pp.1015-1024 〈10.1002/ppap.201600038〉
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https://hal-univ-perp.archives-ouvertes.fr/hal-01467655
Contributeur : Dorian Miler <>
Soumis le : mardi 14 février 2017 - 16:07:34
Dernière modification le : jeudi 11 janvier 2018 - 06:22:15

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R Bazinette, Jean Paillol, Jean-François Lelièvre, Françoise Massines. Atmospheric Pressure Radio-Frequency DBD Deposition of Dense Silicon Dioxide Thin Film. Plasma Processes and Polymers, Wiley-VCH Verlag, 2016, 13 (10), pp.1015-1024 〈10.1002/ppap.201600038〉. 〈hal-01467655〉

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